Paper
7 May 1999 Neural-network-based analysis of photoelastic color using a spectral synthesizer
Wenjun Wang, Satoru Toyooka, H. Nozawa
Author Affiliations +
Proceedings Volume 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99); (1999) https://doi.org/10.1117/12.347792
Event: Optical Engineering for Sensing and Nanotechnology (ICOSN '99), 1999, Yokohama, Japan
Abstract
Spectral distribution of photoelastic color have direct relationship with difference of principal stresses. Spectral distributions corresponding to known stress values are measured and used as learning data of unsupervised neural network. Optimal filter functions are designed by an unsupervised neural network. The learning data is also used as a scale for recognition of spectral distribution of unknown stress. Photoelastic sample under different stresses is illuminated by the light generated by a spectral synthesizer which consist of dispersing system including liquid crystal spatial light (LCSLM) modulator. By controlling the transparency of LCSLM modulator using supervised neural network, several the illuminating light are made so that their spectral distribution are same with filter functions and they are used as the light source photoelastic interferometer. From intensities recorded, spectral distributions are calculated. Stresses are estimated by comparing recorded intensities with scale made from learning data.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wenjun Wang, Satoru Toyooka, and H. Nozawa "Neural-network-based analysis of photoelastic color using a spectral synthesizer", Proc. SPIE 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99), (7 May 1999); https://doi.org/10.1117/12.347792
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KEYWORDS
Photoelasticity

Neural networks

Optical filters

Light sources

Light

Analytical research

Epoxies

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