Paper
23 April 1999 Automatic furnace downloading to SUPREM format
Martin Fallon, Keith Findlater, Jim McGinty, N. Rankin, A. Yarr
Author Affiliations +
Proceedings Volume 3742, Process and Equipment Control in Microelectronic Manufacturing; (1999) https://doi.org/10.1117/12.346234
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom
Abstract
Technology CAD (TCAD) is a commonly used tool in process development and analysis. The task of creating the process in the required format for the TCAD deck is non-trivial and often prone to error due to the detailed nature of the furnace processing. Ensuring that the simulation deck is matched to the actual furnace process is also a key area. There is a difference between what is programmed into the furnace and what the wafers actually see. This work presents a method of automatic download of the actual furnace parameters to a format directly readable by the process simulator SUPREM, and examines the consequences of the furnace variability inherent in batch processing. The three furnace zones can be seen to interact and product best-worst case simulations to aid in the prediction of manufacturability.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Martin Fallon, Keith Findlater, Jim McGinty, N. Rankin, and A. Yarr "Automatic furnace downloading to SUPREM format", Proc. SPIE 3742, Process and Equipment Control in Microelectronic Manufacturing, (23 April 1999); https://doi.org/10.1117/12.346234
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Cited by 1 scholarly publication.
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KEYWORDS
Semiconducting wafers

Data modeling

Process control

Manufacturing

TCAD

Tolerancing

Process modeling

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