Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser

Sarah Bollanti; Paolo Di Lazzaro; Francesco Flora; Tommaso Letardi; Alessandro Marinai; Alessandro Nottola; Kostandia Vigli-Papadaki; A. Vitali; Francesca Bonfigli; Nicola Lisi; Libero Palladino; Armando Reale; Cheng En Zheng

doi:10.1117/12.371128

23 November 1999 Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser

Sarah Bollanti, Paolo Di Lazzaro, Francesco Flora, Tommaso Letardi, Alessandro Marinai, Alessandro Nottola, Kostandia Vigli-Papadaki, A. Vitali, Francesca Bonfigli, Nicola Lisi, Libero Palladino, Armando Reale, Cheng En Zheng

Author Affiliations +

Proceedings Volume 3767, EUV, X-Ray, and Neutron Optics and Sources; (1999) https://doi.org/10.1117/12.371128
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

We present the exciting results obtained by using a natural (i.e. as long as the active medium gain) 120 ns-duration excimer laser pulse focused on relatively thick targets (100 micrometer): a conversion efficiency exceeding 20% has been obtained in the 40 - 70 eV (170 - 300 Angstrom) spectral interval from Cu and Ta targets, with more than 100-ns-FWHM X- ray pulses and low speed (less than 100 m/s) emitted debris. A fast CCD camera is used to reveal the debris and to measure their speed for different laser parameters. These values of debris speed are compatible with the use of a mechanical device to separate them from the X-ray beam and hence to protect the optics of a projection-microlithography system.

Citation Download Citation

Sarah Bollanti, Paolo Di Lazzaro, Francesco Flora, Tommaso Letardi, Alessandro Marinai, Alessandro Nottola, Kostandia Vigli-Papadaki, A. Vitali, Francesca Bonfigli, Nicola Lisi, Libero Palladino, Armando Reale, and Cheng En Zheng "Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); https://doi.org/10.1117/12.371128

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available