Paper
25 October 1999 Diffuse scattering of the conduction electrons of a metallic substrate by an adsorbate: an experimental study using synchrotron infrared radiation
Paul Dumas, Matthias Hein, Andreas Otto, Gwyn P. Williams
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Abstract
Due to its intrinsic high brightness, high stability, and proportionality to the stored electron beam current, synchrotron IR spectroscopy has revealed itself as an unique tool to experimentally test a physical phenomenon that might play an important role at metallic interfaces, the theory for which was motivated by previous observations. Any adsorbate seems to induce an elastic scattering of the conduction electrons, and this reflects in a concomitant broadband IR reflectance change, and a DC resistivity change. By choosing a well-ordered monocrystalline thin film {Cu(111)}, we have checked that the DC resistivity and the asymptotic limit of the IR reflectance changes are linearly dependent, but independent of the nature of the adsorbate. Coadsorption experiments, which have been used to modify the induced density of states at the Fermi level, have further demonstrated that the friction coefficient, which is responsible for the elastic scattering phenomenon, is chemically specific.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul Dumas, Matthias Hein, Andreas Otto, and Gwyn P. Williams "Diffuse scattering of the conduction electrons of a metallic substrate by an adsorbate: an experimental study using synchrotron infrared radiation", Proc. SPIE 3775, Accelerator-based Sources of Infrared and Spectroscopic Applications, (25 October 1999); https://doi.org/10.1117/12.366644
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Cited by 2 scholarly publications.
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KEYWORDS
Reflectivity

Copper

Electrons

Resistance

Scattering

Infrared radiation

Thin films

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