Ablation of solid targets with UV femtosecond pulses

Peter Simon; Juergen Ihlemann; Jan-Hendrik Klein-Wiele; Jozsef Bekesi; Gerd Marowsky

doi:10.1117/12.364219

20 September 1999 Ablation of solid targets with UV femtosecond pulses

Peter Simon, Juergen Ihlemann, Jan-Hendrik Klein-Wiele, Jozsef Bekesi, Gerd Marowsky

Proceedings Volume 3822, Computer-Controlled Microshaping; (1999) https://doi.org/10.1117/12.364219
Event: Industrial Lasers and Inspection (EUROPTO Series), 1999, Munich, Germany

Abstract

Ablation of submicron structures on metals and semiconductors is presented using subpicosecond laser pulses at 248 nm. Morphology changes as a function of pulse duration have been investigated. The dynamics of the surface modification has been studied using a pump-probe technique. Diffracted signals of a probe beam on laser induced gratings provide information on the dynamics of the electron phonon interaction, melting and material removal simultaneously. For metals, in the first 5 - 10 ps following irradiation the electron-phonon relaxation dominates the process, followed by melting, expansion and violent material ejection. For semiconductors, rapid amorphization of the surface occurs within a couple of hundred femtoseconds following irradiation, with less pronounced indication for the development of molten material.

Citation Download Citation

Peter Simon, Juergen Ihlemann, Jan-Hendrik Klein-Wiele, Jozsef Bekesi, and Gerd Marowsky "Ablation of solid targets with UV femtosecond pulses", Proc. SPIE 3822, Computer-Controlled Microshaping, (20 September 1999); https://doi.org/10.1117/12.364219

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