Generation of thin film micro-optics by crossed deposition through wire-grid masks

Uwe Griebner; Ruediger Grunwald

doi:10.1117/12.364294

15 September 1999 Generation of thin film micro-optics by crossed deposition through wire-grid masks

Uwe Griebner, Ruediger Grunwald

Proceedings Volume 3825, Microsystems Metrology and Inspection; (1999) https://doi.org/10.1117/12.364294
Event: Industrial Lasers and Inspection (EUROPTO Series), 1999, Munich, Germany

Abstract

Shading masks consisting of regular grids of thin metallic wires have been used for the vacuum deposition of micro- optical thin film components. The fabrication of cylindrical microlenses with single- and two-step procedures has been demonstrated. Refractive as well as partially reflective arrays with pitches greater than or equal to 50 micrometer have been realized with SiO₂ and SiO₂:HfO₂ layers on glass, quartz and polymer substrates. The thickness profiles have been characterized interferometrically.

Citation Download Citation

Uwe Griebner and Ruediger Grunwald "Generation of thin film micro-optics by crossed deposition through wire-grid masks", Proc. SPIE 3825, Microsystems Metrology and Inspection, (15 September 1999); https://doi.org/10.1117/12.364294

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