Automated-interference-lithography-based systems for generation of submicron-feature size patterns

Douglas S. Hobbs; Bruce D. McLeod; Adam F. Kelsey; Mark A. Leclerc; Ernest Sabatino III

doi:10.1117/12.360517

31 August 1999 Automated-interference-lithography-based systems for generation of submicron-feature size patterns

Douglas S. Hobbs, Bruce D. McLeod, Adam F. Kelsey, Mark A. Leclerc, Ernest Sabatino III

Proceedings Volume 3879, Micromachine Technology for Diffractive and Holographic Optics; (1999) https://doi.org/10.1117/12.360517
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States

Abstract

Interferometric lithography is a maturing technology for patterning large area, periodic sub-micron features. The interference of two or more coherent optical waves is recorded in photoresist to produce a variety of structures including gratings, holes, posts, cones, and grids. This lithographic technique allows maskless patterning of large area substrates using short exposure times. Applications for periodic patterns include distributed feedback lasers, field emission displays, liquid crystal displays, advanced data storage applications, optical gratings, metrology standards, and sub-wavelength structures. Our work is motivated by interest in bringing interferometric patterning out of research laboratories and into mainstream production facilities for high volume applications, by automating and simplifying the exposure process. The concept and operational principles of two automated interference lithography systems, the HLS model 1000, and the HLS model PC2, are introduced.

Citation Download Citation

Douglas S. Hobbs, Bruce D. McLeod, Adam F. Kelsey, Mark A. Leclerc, and Ernest Sabatino III "Automated-interference-lithography-based systems for generation of submicron-feature size patterns", Proc. SPIE 3879, Micromachine Technology for Diffractive and Holographic Optics, (31 August 1999); https://doi.org/10.1117/12.360517

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