Fabrication technique for high-aspect-ratio gratings

Ernst-Bernhard Kley; Hans-Joerg Fuchs; Karsten Zoellner

doi:10.1117/12.360534

31 August 1999 Fabrication technique for high-aspect-ratio gratings

Ernst-Bernhard Kley, Hans-Joerg Fuchs, Karsten Zoellner

Author Affiliations +

Proceedings Volume 3879, Micromachine Technology for Diffractive and Holographic Optics; (1999) https://doi.org/10.1117/12.360534
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States

Abstract

High aspect ratio gratings are of interest for a couple of applications. Especially artificial birefringence based on zero order dielectric gratings are calling for small pitches (e.g. < 450 nm) and a high aspect ratio (e.g. > 10 in fused silica). One of the most difficult problems is to reach the optical parameters that are demanded. Based on e- beam writing, ion beam etching, reactive ion beam etching and chromium coating we developed a technique for the fabrication of such gratings. In result, we reached phase retardation between TM and TE polarization of more than 90 degree(s). An iterative step technique allows realization of the phase retardation of accuracy better than 1%. The highest aspect ratios of the gratings, we fabricated, were in the range of about 25 at 440 nm period and 100 nm gap.

Citation Download Citation

Ernst-Bernhard Kley, Hans-Joerg Fuchs, and Karsten Zoellner "Fabrication technique for high-aspect-ratio gratings", Proc. SPIE 3879, Micromachine Technology for Diffractive and Holographic Optics, (31 August 1999); https://doi.org/10.1117/12.360534

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