Major improvements in mask CD metrology: enhanced performance on attenuated phase-shift masks, corner rounding measurements, and improved measurement automation

Gerhard W.B. Schlueter; Gerd Scheuring; Guenther Falk; Hans-Juergen Brueck; Thomas Schaetz; Sigrid Lehnigk

doi:10.1117/12.377103

3 February 2000 Major improvements in mask CD metrology: enhanced performance on attenuated phase-shift masks, corner rounding measurements, and improved measurement automation

Gerhard W.B. Schlueter, Gerd Scheuring, Guenther Falk, Hans-Juergen Brueck, Thomas Schaetz, Sigrid Lehnigk

Author Affiliations +

Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377103
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany

Abstract

With continuously shrinking design rules enhanced techniques are required in mask manufacture which requires more sophisticated procedures for their characterization. As Phase Shift Masks (PSM) are of growing importance a new CD algorithm had to be developed to achieve the same or even higher level of CD accuracy and repeatability as on chrome masks. Major improvements in measurement performance on attenuated PSM have been achieved resulting from improving the PSM CD algorithm based on the experiences reported earlier. With shrinking feature sizes and masks layouts with denser patterns the quantification of corner rounding effects on contacts and line ends is of growing importance. Based on the algorithm developed for the effect of corner rounding on line end shortening a measurement procedure has been developed for contact holes. Measurement results have been shown. To further improving CD measurement automation and to enable easy measurement job modifications a highly flexible device has been developed to import measurement parameters into a macro template.

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Gerhard W.B. Schlueter, Gerd Scheuring, Guenther Falk, Hans-Juergen Brueck, Thomas Schaetz, and Sigrid Lehnigk "Major improvements in mask CD metrology: enhanced performance on attenuated phase-shift masks, corner rounding measurements, and improved measurement automation", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); https://doi.org/10.1117/12.377103

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KEYWORDS

Algorithm development

Photomasks

Critical dimension metrology

Detection and tracking algorithms

Phase shifts

Manufacturing

Calibration

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