Overlay performance on tungsten CMP layers using the ATHENA alignment system

Giovanni Rivera; Laura Rozzoni; Elisabetta Castellana; Guido Miraglia; Pui Leng Lam; Johannes Plauth; Allan Dunbar; Merritt Phillips

doi:10.1117/12.386498

2 June 2000 Overlay performance on tungsten CMP layers using the ATHENA alignment system

Giovanni Rivera, Laura Rozzoni, Elisabetta Castellana, Guido Miraglia, Pui Leng Lam, Johannes Plauth, Allan Dunbar, Merritt Phillips

Author Affiliations +

Proceedings Volume 3998, Metrology, Inspection, and Process Control for Microlithography XIV; (2000) https://doi.org/10.1117/12.386498
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

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Giovanni Rivera, Laura Rozzoni, Elisabetta Castellana, Guido Miraglia, Pui Leng Lam, Johannes Plauth, Allan Dunbar, and Merritt Phillips "Overlay performance on tungsten CMP layers using the ATHENA alignment system", Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); https://doi.org/10.1117/12.386498

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