Linewidth uniformity error analysis for step-and-scan systems

John D. Zimmerman; Javed Sumra; Y.K. Arif Leong; Pradeep K. Govil; Greg H. Baxter

doi:10.1117/12.389071

5 July 2000 Linewidth uniformity error analysis for step-and-scan systems

John D. Zimmerman, Javed Sumra, Y.K. Arif Leong, Pradeep K. Govil, Greg H. Baxter

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389071
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The analysis proposed attempts to identify the systematic and non-systematic errors in linewidth uniformity data and their magnitudes. Specific to step-and-scan systems are various error components to linewidth such as optical slot errors, stage scan errors and wafer residual errors. We explore ways of handling these errors and applying developed methods to actual micrascan data in order to understand how to improve linewidth control.

Citation Download Citation

John D. Zimmerman, Javed Sumra, Y.K. Arif Leong, Pradeep K. Govil, and Greg H. Baxter "Linewidth uniformity error analysis for step-and-scan systems", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389071

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