Paper
5 July 2000 Performance of very high repetition rate ArF lasers
Jean-Marc Hueber, Herve Besaucele, Palash P. Das, Rick Eis, Alexander I. Ershov, Vladimir B. Fleurov, Dmitri Gaidarenko, Thomas Hofmann, Paul C. Melcher, William N. Partlo, Bernard K. Nikolaus, Scot Smith, Kyle Webb
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Abstract
We report the performance of a very high repetition rate ArF laser optimized for next generation, high NA, high throughput scanner. The laser's repetition rate exceeds 4kHz, at 5mJ, and at bandwidths of less than 1.2 pm. We discuss the complexity of high power operation, and make some estimates about the robustness of this technology. In particular, we discuss the risks of scaling to this high repetition rate, and prospects of exceeding 4kHz to near 6kHz with 95 percent bandwidths of less than 1pm.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jean-Marc Hueber, Herve Besaucele, Palash P. Das, Rick Eis, Alexander I. Ershov, Vladimir B. Fleurov, Dmitri Gaidarenko, Thomas Hofmann, Paul C. Melcher, William N. Partlo, Bernard K. Nikolaus, Scot Smith, and Kyle Webb "Performance of very high repetition rate ArF lasers", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388979
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Cited by 3 scholarly publications.
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KEYWORDS
Laser applications

3D scanning

Laser development

Laser scanners

Pulsed laser operation

Laser optics

Semiconducting wafers

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