Thin Film Deposition Using SOL-GEL Technology

R. Puyane; C. J. R. Gonzalez-Oliver

doi:10.1117/12.935532

28 November 1983 Thin Film Deposition Using SOL-GEL Technology

R. Puyane, C. J. R. Gonzalez-Oliver

Proceedings Volume 0401, Thin Film Technologies I; (1983) https://doi.org/10.1117/12.935532
Event: 1983 International Technical Conference/Europe, 1983, Geneva, Switzerland

Abstract

Sol-Gel technology can be used to deposit a wide variety of oxide coatings on substrates such as glass, ceramics or metals. This presentation outlines the fundamentals of the process and the possibilities offered by this technique. Several oxide layers have been prepared in our laboratories including single oxides like SiO2, TiO₂, ZrO₂, VO₂_+x, V₂0₅, as well as multicomponent systems such as SiO₂-Ge0₂, SiO₂-TiO2, SiO₂-Y20₃ and SiO2-TiO₂-Al₂0₃. The coatings are deposited by dipping the substrate into a solution containing the appropriate organometallic compound with control of the surrounding atmosphere. Subsequent thermal treatments are required to eliminate the volatile solvents, which are physically and chemically absorbed into the oxide layer and to densify the layers. The first thermal treatments are carried out at temperatures up to 150°C. Further treatments up to about 600°C (depending on oxide composition) are necessary to eliminate organic traces and residual moisture as well as to harden further the oxide coating.

Citation Download Citation

R. Puyane and C. J. R. Gonzalez-Oliver "Thin Film Deposition Using SOL-GEL Technology", Proc. SPIE 0401, Thin Film Technologies I, (28 November 1983); https://doi.org/10.1117/12.935532

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