Paper
18 July 2000 18- to 20-nm broadband multilayer at normal incidence
Changjun Ke, Zhansan Wang, Y. Z. Ma, Jianlin Cao, Xingdan Chen
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Abstract
A better random method used for improving light throughput of a soft X-ray multilayer has been developed in the 18 - 20 nm spectral region, it bases on the traditional theory of periodic multilayer, a 8% gain in integrated reflectance is obtained. We present ensemble calculation at the same time, and the multilayer is fabricated by magnetron sputtering. Finally low-angle X-ray diffraction and reflectance comparative measurement are used for testing the multilayer. The results demonstrate that layer thickness disorder yields band broadening (for both wavelength and angle) and increased integrated reflectance in the spectral range with respect to periodic multilayer, but accompanied with a reduction in reflectance peak. Layer thickness disorder makes it more difficult to fabricate broadband multilayer, raising the techniques of control layer thickness is the keystone of experiments.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Changjun Ke, Zhansan Wang, Y. Z. Ma, Jianlin Cao, and Xingdan Chen "18- to 20-nm broadband multilayer at normal incidence", Proc. SPIE 4012, X-Ray Optics, Instruments, and Missions III, (18 July 2000); https://doi.org/10.1117/12.391570
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KEYWORDS
Reflectivity

Multilayers

X-rays

Sputter deposition

X-ray diffraction

Diffraction

Calibration

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