EUV mask absorber characterization and selection

Pei-yang Yan; Guojing Zhang; Patrick Kofron; Jeffrey E. Powers; Mark Tran; Ted Liang; Alan R. Stivers; Fu-Chang Lo

doi:10.1117/12.392025

19 July 2000 EUV mask absorber characterization and selection

Pei-yang Yan, Guojing Zhang, Patrick Kofron, Jeffrey E. Powers, Mark Tran, Ted Liang, Alan R. Stivers, Fu-Chang Lo

Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392025
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan

Abstract

In this paper, we will present our research work in EUVL mask absorber characterization and selection. The EUV mask patterning process development depends on the choice of EUVL mask absorber material, which has direct impact on the mask quality such as critical dimension (CD) control, and registration. EUVL mask absorber material selection consideration involves many aspects of material properties and processes. These include film absorption at EUV wavelength, film emissivity, film stress, mask CD and defect control, defect inspection contrast, absorber repair selectivity to the buffer layer, etc. The selection of the best candidate is non-trivial since no material is found to be superior in all aspects. In an effort of searching the best absorber materials and processes, we evaluated Al-Cu, Ti, TiN, Ta, TaN, and Cr absorbers. The comparison of material intrinsic properties and process properties allowed us to focus on the most promising absorbers and to further develop the corresponding processes to meet EUVL requirement.

Citation Download Citation

Pei-yang Yan, Guojing Zhang, Patrick Kofron, Jeffrey E. Powers, Mark Tran, Ted Liang, Alan R. Stivers, and Fu-Chang Lo "EUV mask absorber characterization and selection", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392025

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available