Paper
11 July 2000 Low-dielectric-constant photoresists for insulation on TFT array
Rong-Jer Lee, YouCheng Wu, ShihLieh Chen, Song-Shiang Lin, HsienWen Chien
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Abstract
This paper describes a low dielectric constant, high resolution and high brightness single layer positive photoresist on TFT array. A currently used positive photoresist comprising of low dielectric constant materials and a chemically amplified resis system is designed for the insulation layer on TFT array to enlarge pixel aperture ration of TFT-LCD.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rong-Jer Lee, YouCheng Wu, ShihLieh Chen, Song-Shiang Lin, and HsienWen Chien "Low-dielectric-constant photoresists for insulation on TFT array", Proc. SPIE 4078, Optoelectronic Materials and Devices II, (11 July 2000); https://doi.org/10.1117/12.392115
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KEYWORDS
Photoresist materials

Dielectrics

Optical filters

Amorphous silicon

Electrodes

Transmittance

Ultraviolet radiation

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