Effects of sputtering parameters on the optical properties of AgInSbTe phase-change film

Jinyan Li; Lisong Hou; Hao Ruan; Quan Xie; Fuxi Gan

doi:10.1117/12.416824

7 February 2001 Effects of sputtering parameters on the optical properties of AgInSbTe phase-change film

Jinyan Li, Lisong Hou, Hao Ruan, Quan Xie, Fuxi Gan

Proceedings Volume 4085, Fifth International Symposium on Optical Storage (ISOS 2000); (2001) https://doi.org/10.1117/12.416824
Event: Fifth International Symposium on Optical Storage (IS0S 2000), 2000, Shanghai, China

Abstract

AgInSbTe phase-change films were deposited on K9 glass substrates by RF magnetron sputtering technology using a Ag- In-Sb-Te alloy target. The as-deposited films were annealed at 300 degrees Celsius. The influence of background pressure, sputtering gas pressure and sputtering power on the optical properties of the phase-change films were investigated. It was found that the optical properties of the phase change films were synthetically affected by the sputtering parameters. It is disadvantageous to the optical properties of the films when the sputtering gas pressure and power are too high or too low. Lower background pressure, proper sputtering gas pressure and sputtering power are very important to producing the phase- change films with good properties.

Citation Download Citation

Jinyan Li, Lisong Hou, Hao Ruan, Quan Xie, and Fuxi Gan "Effects of sputtering parameters on the optical properties of AgInSbTe phase-change film", Proc. SPIE 4085, Fifth International Symposium on Optical Storage (ISOS 2000), (7 February 2001); https://doi.org/10.1117/12.416824

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