Measuring rotating substrate temperature by laser

Siyuan Lu; Xiufang Ma; Yuanhua Shen

doi:10.1117/12.408402

29 November 2000 Measuring rotating substrate temperature by laser

Siyuan Lu, Xiufang Ma, Yuanhua Shen

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408402
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

Temperature measurement by laser, which has the advantage of accuracy, rapidity and non-touching is suitable for measuring the temperature of substrate in vacuum coating plant. But till now this method was limited to measuring the stationary substrate, which couldn't meet the need of practical coating process because substrate rotating is essential for the uniformity of heating and coating. Since the thickness of the laser incident point changes with the rotating of the substrate, the interference fringe movement either caused by this reason or by temperature increment can't be distinguished. Recently we developed an automatic measuring system being able to measure the temperature of a rotating substrate. The installment of a micro-switch on the stationary frame and a projection on the turntable enables the computer to count the movement of interference fringes when and only when the substrate turns to an identical position. This development makes the method more useful in practical coating process. The design for the system is outlined, the measuring process is detailed, and an example of temperature measurement is presented.

Citation Download Citation

Siyuan Lu, Xiufang Ma, and Yuanhua Shen "Measuring rotating substrate temperature by laser", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408402

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KEYWORDS

Temperature metrology

Coating

Calibration

CCD cameras

Glasses

Helium neon lasers

Interfaces

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