Paper
15 December 2000 Photochromic reaction of spiropyran in polymer matrices
Amir Tork, Francois Boudreault, Mathieu Roberge, Tigran V. Galstian, Roger A. Lessard, Anna-Marie R. Ritcey
Author Affiliations +
Proceedings Volume 4087, Applications of Photonic Technology 4; (2000) https://doi.org/10.1117/12.406295
Event: 2000 International Conference on Application of Photonic Technology (ICAPT 2000), 2000, Quebec City, Canada
Abstract
The photo excitations of Spiropyran-doped polymer films were studied. Cellulose acetate (CA), commercial ploy(methyl methacrylate) (PMMA) and PMMA prepared by radical polymerisation of MMA, were used as host polymer matrices. The open form of SP presents a maximum of absorption cantered at about 600 nm upon UV irradiation. We have determined the photoreaction rate constants, kuv and k15, for the coloring and bleaching processes. Reversible holographic recording in SPIPMMA films was studied and photochemical fatigue resistance was evaluated upon repeated UVfVisible irradiation cycles. We found a loss of 42, 53 and 74% respectively in PMMA by gravity deposition, PMMA (by polymerisation of MMA) and cellulose acetate films.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Amir Tork, Francois Boudreault, Mathieu Roberge, Tigran V. Galstian, Roger A. Lessard, and Anna-Marie R. Ritcey "Photochromic reaction of spiropyran in polymer matrices", Proc. SPIE 4087, Applications of Photonic Technology 4, (15 December 2000); https://doi.org/10.1117/12.406295
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KEYWORDS
Polymethylmethacrylate

Polymers

Surface plasmons

Matrices

Polymerization

Absorption

Resistance

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