Structural and optical properties of TiO2-SiO2 composite films deposited by chemical vapor deposition at low-SiO2-content region

Jeong-Hoon Park; WoonJo Cho; KugSun Hong

doi:10.1117/12.405271

25 October 2000 Structural and optical properties of TiO₂-SiO₂ composite films deposited by chemical vapor deposition at low-SiO₂-content region

Jeong-Hoon Park, WoonJo Cho, KugSun Hong

Author Affiliations +

Proceedings Volume 4102, Inorganic Optical Materials II; (2000) https://doi.org/10.1117/12.405271
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

We, here, present the study on the crystalline behavior of TiO₂ in the presence of SiO₂ and its optical property at low SiO₂ content region from x equals 0 and 0.12 in the (1-x)TiO₂-xSiO₂ system. From X-ray diffraction, it is observed that just a small addition of SiO₂ into TiO₂-SiO₂ films has made a rutile peak completely vanish. Anatase peaks were decreased in intensity and broadened with the increase in added SiO₂ content. Besides, anatase peak was shifted to the large d-spacing and its means that Si ions have incorporated into TiO₂. However, the anatase peak shift was saturated above 8 mol%. These facts confirmed that incorporated Si ions inhibited the phase transition between the rutile and the anatase and the crystallization of anatase is also suppressed with SiO₂ addition. The anatase band frequency (approximately 140 cm^-1) shift to the higher one in Raman spectra and the appearance of the band due to Si-O-Ti vibration in IR spectra indicates clearly that the SiO₂ incorporation happens as SiO₂ is added in films. The surface topography observed by SEM and AFM shows that the surface becomes smooth and the TiO₂ crystallite become smaller with increasing SiO₂ content. UV-Visible transmittance spectra showed that all films have good transparency up to about 90% in visible region.

Citation Download Citation

Jeong-Hoon Park, WoonJo Cho, and KugSun Hong "Structural and optical properties of TiO₂-SiO₂ composite films deposited by chemical vapor deposition at low-SiO₂-content region", Proc. SPIE 4102, Inorganic Optical Materials II, (25 October 2000); https://doi.org/10.1117/12.405271

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