Patterned dye diffusion using transferred photoresist for polymer OLED displays

Florian Pschenitzka; James C. Sturm

doi:10.1117/12.416876

2 February 2001 Patterned dye diffusion using transferred photoresist for polymer OLED displays

Florian Pschenitzka, James C. Sturm

Proceedings Volume 4105, Organic Light-Emitting Materials and Devices IV; (2001) https://doi.org/10.1117/12.416876
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

A method of large-area dye diffusion for patterning the emissive color of organic light-emitting devices (OLEDs) using transferred photoresist is introduced. Using a large-area dye diffusion source, the dye is diffused into the emissive layer of the OLED. To locally pattern the emissive color, either a shadow mask or a patterned dye source has to be used. The implementation of both approaches using photolithographic patterning and transferred photoresist is outlined in this paper. In addition, a method using transferred photoresist for patterning of the cathode will be discussed.

Citation Download Citation

Florian Pschenitzka and James C. Sturm "Patterned dye diffusion using transferred photoresist for polymer OLED displays", Proc. SPIE 4105, Organic Light-Emitting Materials and Devices IV, (2 February 2001); https://doi.org/10.1117/12.416876

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