Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability

Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Sebastian Oestreich; Edward L. G. Maas; M. J. H. Kessels; Detlef Schmitz; Frank Scholze; Gerhard Ulm; Stefan Muellender; Markus Haidl; Fred Bijkerk

doi:10.1117/12.406676

8 November 2000 Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability

Eric Louis, Andrey E. Yakshin, Peter C. Goerts, Sebastian Oestreich, Edward L. G. Maas, M. J. H. Kessels, Detlef Schmitz, Frank Scholze, Gerhard Ulm, Stefan Muellender, Markus Haidl, Fred Bijkerk

Author Affiliations +

Proceedings Volume 4146, Soft X-Ray and EUV Imaging Systems; (2000) https://doi.org/10.1117/12.406676
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

High performance reflective coatings for EUVL projection systems can be produced by using e-beam evaporation in combination with ion beam smoothening of the interfaces. Using this technique, we recently demonstrated a near normal incidence reflectivity of 69.5%. Another, equally important part of the optimization of the coating process is the lateral control of the thickness of the layers, that is the d-spacing of the coating. In this paper we demonstrate the ability to obtain a uniformity of the d-spacing of the coating of better than +/- 0.05% over a 6' area, both on flat and concave surfaces (uniformity specified in terms of wavelength of maximum reflectance). All reflectance measurements have been carried out at the PTB facilities at the electron storage rings BESSY I and BESSY II in Berlin.

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Eric Louis, Andrey E. Yakshin, Peter C. Goerts, Sebastian Oestreich, Edward L. G. Maas, M. J. H. Kessels, Detlef Schmitz, Frank Scholze, Gerhard Ulm, Stefan Muellender, Markus Haidl, and Fred Bijkerk "Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); https://doi.org/10.1117/12.406676

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