Paper
15 August 2000 Low-power micromachined structures for gas sensors with improved robustness
Isabel Gracia, Andreas Goetz, Jose Antonio Plaza, Carles Cane, Patrice Roetsch, Harald Boettner, Klaus Seibert
Author Affiliations +
Proceedings Volume 4176, Micromachined Devices and Components VI; (2000) https://doi.org/10.1117/12.395637
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
Abstract
Current research on microstructures for semiconductor gas sensors is on development on low power and robust substrates. In this paper a microstructure based on the combination of micromachined silicon substrates and glass wafers is presented. This device shows high robustness and can reach high temperatures up to 700$DEGC with good power consumption. The optimisation of the design and the process fabrication is described.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Isabel Gracia, Andreas Goetz, Jose Antonio Plaza, Carles Cane, Patrice Roetsch, Harald Boettner, and Klaus Seibert "Low-power micromachined structures for gas sensors with improved robustness", Proc. SPIE 4176, Micromachined Devices and Components VI, (15 August 2000); https://doi.org/10.1117/12.395637
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KEYWORDS
Silicon

Glasses

Etching

Gas sensors

Semiconducting wafers

Resistors

Dielectrics

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