Electroplated solenoid-type inductors for CMOS rf CO

Chul Nam; Wonseo Choi; KukJin Chun

doi:10.1117/12.404888

20 October 2000 Electroplated solenoid-type inductors for CMOS rf CO

Chul Nam, Wonseo Choi, KukJin Chun

Proceedings Volume 4230, Micromachining and Microfabrication; (2000) https://doi.org/10.1117/12.404888
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore

Abstract

A Solenoid-type Inductors have been realized using electroplating technique mainly used for 2 Ghz band CMOS RF VCO applications. The integrated spiral inductor has low Q factor due to substrate loss and skin effects. And it also occupies large area compared to solenoid-type inductor. The direction of flux of the solenoid-type inductor is parallel to the substrate, which can lower substrate loss and other interference with integrated passive components. In this research, Solenoid-type inductors are simulated and modeled as equivalent circuit for CMOS RF VCO based on extracted S- parameters. The electroplated solenoid-type inductors are fabricated on both a standard silicon substrate and glass substrate by thick PR photolithography and copper electroplating. The achieved inductance varies range from 1 nH to 5 nH, and maximum Q factor over 10. The inductors are scheduled to be integrated on CMOS RF VCO with RF MEMS capacitor for future.

Citation Download Citation

Chul Nam, Wonseo Choi, and KukJin Chun "Electroplated solenoid-type inductors for CMOS rf CO", Proc. SPIE 4230, Micromachining and Microfabrication, (20 October 2000); https://doi.org/10.1117/12.404888

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