Study on mask technology of CVD diamond thin films by RIE etching

Chunsheng Yang; Guifu Ding; Xiang Yao; Xiaolin Zhao

doi:10.1117/12.404906

20 October 2000 Study on mask technology of CVD diamond thin films by RIE etching

Chunsheng Yang, Guifu Ding, Xiang Yao, Xiaolin Zhao

Proceedings Volume 4230, Micromachining and Microfabrication; (2000) https://doi.org/10.1117/12.404906
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore

Abstract

The patterning of diamond thin films by RIE etching must use hard mask. Ni and NiTi thin films are better candidate to be used as diamond mask based on mask selective ratio and patterning process. NiTi thin film mask has higher etching selective ratio than that of Ni thin film, Ni thin film plating through mask is applicable to small microstructure fabrication because of moderate etching selective ratio, accurate in dimension control and easy to make multilayer microstructure. The diamond thin film microstructure using NiTi and Ni thin film masks fabricated by RIE etching have straight line and sharp sidewall.

Citation Download Citation

Chunsheng Yang, Guifu Ding, Xiang Yao, and Xiaolin Zhao "Study on mask technology of CVD diamond thin films by RIE etching", Proc. SPIE 4230, Micromachining and Microfabrication, (20 October 2000); https://doi.org/10.1117/12.404906

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