Development of ultrahigh-density micro gas discharge lamp array using coherent porous Si technology

Shekhar Bhansali; Brent VanDyke; H. Thurman Henderson

doi:10.1117/12.420889

21 March 2001 Development of ultrahigh-density micro gas discharge lamp array using coherent porous Si technology

Shekhar Bhansali, Brent VanDyke, H. Thurman Henderson

Proceedings Volume 4235, Smart Structures and Devices; (2001) https://doi.org/10.1117/12.420889
Event: Smart Materials and MEMS, 2000, Melbourne, Australia

Abstract

This work investigates a radical new approach for plasma display production that is potentially easier to produce and results in plasma displays that are of significantly higher resolution. Most of the current modern plasma displays operate on essentially the same principle as a cathode ray tube. Using this technique, plasma displays are capable of resolutions of 1024 by 1024 pixels on a 42-inch display [1]. This is equivalent to 215 pixels per square cm. In this paper we propose a new application of the Coherent Porous Silicon enabled fabrication technique that can be used to develop a display that contains 250,000 discharge lamps per square centimeter. This is over three orders of magnitude better density than the current displays. The core CPS technology at the heart of this application can be used to produce substrates with over 1,000,000 pores per square centimeter, allowing development of even higher density displays. The paper discusses the fabrication technology and underlying experiments that have been successfully conducted to validate the concept and reports on the feasibility studies that have been carried out.

Citation Download Citation

Shekhar Bhansali, Brent VanDyke, and H. Thurman Henderson "Development of ultrahigh-density micro gas discharge lamp array using coherent porous Si technology", Proc. SPIE 4235, Smart Structures and Devices, (21 March 2001); https://doi.org/10.1117/12.420889

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