High-intensity laser processing of thin films

Vladislav V. Yakovlev; J. Magyar; C. Aita; A. Sklyarov; Katerina Mikhailichenko

doi:10.1117/12.432520

29 June 2001 High-intensity laser processing of thin films

Vladislav V. Yakovlev, J. Magyar, C. Aita, A. Sklyarov, Katerina Mikhailichenko

Proceedings Volume 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI; (2001) https://doi.org/10.1117/12.432520
Event: Photonics West 2001 - LASE, 2001, San Jose, CA, United States

Abstract

We use high intensity nanosecond laser pulses of different wavelengths to modify thin film coatings (silica and titania) on the surface of silicon. We find that films as thick as 1 micron can be removed from the surface in one shot with minor or no damage to the Si surface. We also find the accumulated effect of multiple pulse irradiation. Finally we report our preliminary results on phase transformations in titania films induced by high intensity laser.

Citation Download Citation

Vladislav V. Yakovlev, J. Magyar, C. Aita, A. Sklyarov, and Katerina Mikhailichenko "High-intensity laser processing of thin films", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); https://doi.org/10.1117/12.432520

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