Multilevel nanoscale DOE optimization, fabrication, and replication

Dennis W. Prather; David Pustai; Marion R. LeCompte; Shouyuan Shi

doi:10.1117/12.424854

16 April 2001 Multilevel nanoscale DOE optimization, fabrication, and replication

Dennis W. Prather, David Pustai, Marion R. LeCompte, Shouyuan Shi

Author Affiliations +

Proceedings Volume 4291, Diffractive and Holographic Technologies for Integrated Photonic Systems; (2001) https://doi.org/10.1117/12.424854
Event: Symposium on Integrated Optics, 2001, San Jose, CA, United States

Abstract

In this paper, we employ a wavelet-based electromagnetic optimization algorithm to enhance multilevel diffractive lens performance. As we show in this paper, the optimized performance and iteration time is very much a function of the initial lens profile. To demonstrate this we analyze various types of initial profiles ranging from scalar-based lenses to flat and random structures. Additionally, we characterize the performance of replicated multilevel lenses fabricated using a soft lithographic technique known as nanoimprint lithography ( NIL) . Experimentalresults are presented.

Citation Download Citation

Dennis W. Prather, David Pustai, Marion R. LeCompte, and Shouyuan Shi "Multilevel nanoscale DOE optimization, fabrication, and replication", Proc. SPIE 4291, Diffractive and Holographic Technologies for Integrated Photonic Systems, (16 April 2001); https://doi.org/10.1117/12.424854

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