Advanced point diffraction interferometer for EUV aspherical mirrors

Kazuya Ota; Takahiro Yamamoto; Yusuke Fukuda; Katsura Otaki; Iwao Nishiyama; Shinji Okazaki

doi:10.1117/12.436686

20 August 2001 Advanced point diffraction interferometer for EUV aspherical mirrors

Kazuya Ota, Takahiro Yamamoto, Yusuke Fukuda, Katsura Otaki, Iwao Nishiyama, Shinji Okazaki

Author Affiliations +

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436686
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

An advanced point diffraction interferometer for measuring EUV aspherical mirrors with high accuracy has been developed. It is designed for measuring various EUV mirrors with high accuracy and high precision. It can measure the surface figure of all mirrors that will be used in high numerical aperture systems. Using this interferometer, 0.1nm rms precision and 0.2nm rms accuracy are expected.

Citation Download Citation

Kazuya Ota, Takahiro Yamamoto, Yusuke Fukuda, Katsura Otaki, Iwao Nishiyama, and Shinji Okazaki "Advanced point diffraction interferometer for EUV aspherical mirrors", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436686

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