Nikon EB Stepper: the latest development status

Kazuaki Suzuki; Tomoharu Fujiwara; Kazunari Hada; Noriyuki Hirayanagi; Shintaro Kawata; Kenji Morita; Kazuya Okamoto; Teruaki Okino; Sumito Shimizu; Takehisa Yahiro; Hajime Yamamoto

doi:10.1117/12.436632

20 August 2001 Nikon EB Stepper: the latest development status

Kazuaki Suzuki, Tomoharu Fujiwara, Kazunari Hada, Noriyuki Hirayanagi, Shintaro Kawata, Kenji Morita, Kazuya Okamoto, Teruaki Okino, Sumito Shimizu, Takehisa Yahiro, Hajime Yamamoto

Author Affiliations +

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436632
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

The latest development status of EB Stepper is reported. The experimental data include the latest resist image data exposed by 100keV electron beam, mask error factors and dosage margins at several backscattered electron levels, transmission data of continuous membrane reticles, and recommended structures for alignment marks, etc. The basic studies related to system design are also explained, those are the strategy for the management of reticle deformation and the stitching accuracy in overlaid layers, etc. Through these data, the resolution capability down to 50nm technology node is clearly shown and alignment/stitching capability is also described. The requirement to a continuous membrane reticle is indicated from experimental data.

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Kazuaki Suzuki, Tomoharu Fujiwara, Kazunari Hada, Noriyuki Hirayanagi, Shintaro Kawata, Kenji Morita, Kazuya Okamoto, Teruaki Okino, Sumito Shimizu, Takehisa Yahiro, and Hajime Yamamoto "Nikon EB Stepper: the latest development status", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436632

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