PREVAIL-EPL alpha tool electron optics subsystem

Hans C. Pfeiffer; Rajinder S. Dhaliwal; Steven D. Golladay; Samuel K. Doran; Michael S. Gordon; Rodney A. Kendall; Jon E. Lieberman; David J. Pinckney; Robert J. Quickle; Christopher F. Robinson; James D. Rockrohr; Werner Stickel; Eileen V. Tressler

doi:10.1117/12.436711

20 August 2001 PREVAIL-EPL alpha tool electron optics subsystem

Hans C. Pfeiffer, Rajinder S. Dhaliwal, Steven D. Golladay, Samuel K. Doran, Michael S. Gordon, Rodney A. Kendall, Jon E. Lieberman, David J. Pinckney, Robert J. Quickle, Christopher F. Robinson, James D. Rockrohr, Werner Stickel, Eileen V. Tressler

Author Affiliations +

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436711
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

The IBM/Nikon alliance is continuing pursuit of an EPL stepper alpha tool based on the PREVAIL technology. This paper provides a status report of the alliance activity with particular focus on the Electron Optical Subsystem developed at IBM. We have previously reported on design features of the PREVAIL alpha system. The new state-of-the-art e-beam lithography concepts have since been reduced to practice and turned into functional building blocks of a production level lithography tool. The electron optical alpha tool subsystem has been designed, build, assembled and tested at IBM's Semiconductor Research and Development Center (SRDC) in East Fishkill, New York. After demonstrating subsystem functionality, the electron optical column and all associated control electronics hardware and software have been shipped during January 2001 to Nikon's facility in Kumagaya, Japan, for integration into the Nikon commercial e-beam stepper alpha tool. Early pre-shipment results obtained with this electron optical subsystem are presented.

Citation Download Citation

Hans C. Pfeiffer, Rajinder S. Dhaliwal, Steven D. Golladay, Samuel K. Doran, Michael S. Gordon, Rodney A. Kendall, Jon E. Lieberman, David J. Pinckney, Robert J. Quickle, Christopher F. Robinson, James D. Rockrohr, Werner Stickel, and Eileen V. Tressler "PREVAIL-EPL alpha tool electron optics subsystem", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436711

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE