Spectroscopic and energetic investigation of capillary discharges devoted to EUV production for new lithography generation

Eric Robert; Branimir M. Blagojevic; Remi Dussart; Smruti R. Mohanty; Moulay M. Idrissi; Dunpin Hong; Raymond Viladrosa; Jean-Michel Pouvesle; Claude Fleurier; Christophe Cachoncinlle

doi:10.1117/12.436689

20 August 2001 Spectroscopic and energetic investigation of capillary discharges devoted to EUV production for new lithography generation

Eric Robert, Branimir M. Blagojevic, Remi Dussart, Smruti R. Mohanty, Moulay M. Idrissi, Dunpin Hong, Raymond Viladrosa, Jean-Michel Pouvesle, Claude Fleurier, Christophe Cachoncinlle

Author Affiliations +

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436689
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

In this work, ablative and gas capillary discharges have been investigated as potential sources for the EUV lithography technology. Carbon and lithium ablative discharge spectroscopy and EUV energy measurements have been performed. Gas (O₂, Ne, Ar, Kr and Xe) capillary discharge were powered by fast, nanosecond, high voltage Blumlein-like pulser. Detailed investigation of capillary length and diameter, gas pressure, capacitance and inductance of the electrical driver are documented. The energy density, expressed in J cm^-3, appears as a monitoring factor for an efficient production of 13.5 nm radiation band. The measurement and the evaluation of measurement uncertainties lead to the conclusion that the in band, 13.5 nm +/- 0.9 nm, energy radiated by the Xe lamp developed in this work ranges from 0.5 mJ/sr/shot to 20 mJ/sr/shot for a 7 J energy input. Repetition rate investigation of the first prototype have shown operation at 50 Hz in continuous mode and up to 350 Hz in burst mode.

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Eric Robert, Branimir M. Blagojevic, Remi Dussart, Smruti R. Mohanty, Moulay M. Idrissi, Dunpin Hong, Raymond Viladrosa, Jean-Michel Pouvesle, Claude Fleurier, and Christophe Cachoncinlle "Spectroscopic and energetic investigation of capillary discharges devoted to EUV production for new lithography generation", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436689

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