Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base

William D. Hinsberg; Seok-Won Lee; Hiroshi Ito; Donald E. Horne; Kay K. Kanazawa

doi:10.1117/12.436809

24 August 2001 Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base

William D. Hinsberg, Seok-Won Lee, Hiroshi Ito, Donald E. Horne, Kay K. Kanazawa

Author Affiliations +

Proceedings Volume 4345, Advances in Resist Technology and Processing XVIII; (2001) https://doi.org/10.1117/12.436809
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

We describe here experiments aimed at probing the interfacial behavior of thin polymer films during dissolution. We have constructed and characterized a unique quartz-crystal microbalance dissolution rate monitor that allows changes in both oscillation frequency and resistance to be accurately recorded at high data rates during film dissolution. Depending on polymer structure and properties, the resistance to be accurately recorded at high data rates during film dissolution. Depending on polymer structure and properties, the resistance can remain nearly constant, or can undergo enormous fluctuations that are indicative of transient changes in mechanical properties of the polymer layer during the dissolution process. A theoretical description allows the measured resistance to be related to the structure and properties of the dissolving film. This QCM apparatus has been coupled with a custom high-speed visible reflectance spectrometer, and with an infrared spectrometer, to provide information on the structure of the dissolving film and its chemical composition. The dissolution and swelling of well-defined acrylic and alicyclic copolymers in aqueous base has been examined using these techniques.

Citation Download Citation

William D. Hinsberg, Seok-Won Lee, Hiroshi Ito, Donald E. Horne, and Kay K. Kanazawa "Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); https://doi.org/10.1117/12.436809

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available