Direct laser-writing of diffractive array illuminators operable at two wavelengths

Jun Amako; Kimio Nagasaka; Eiich Fujii

doi:10.1117/12.427085

8 May 2001 Direct laser writing of diffractive array illuminators operable at two wavelengths

Jun Amako, Kimio Nagasaka, Eiich Fujii

Proceedings Volume 4416, Optical Engineering for Sensing and Nanotechnology (ICOSN 2001); (2001) https://doi.org/10.1117/12.427085
Event: Optical Engineering for Sensing and Nanotechnology (ICOSN '01), 2001, Yokohama, Japan

Abstract

We present a grating array illuminator that serves at two different wavelengths. The grating was designed by simulated annealing method and drawn in photoresist by direct laser lithography that we have developed on optical disk mastering technology. Upon grating reconstruction with two chosen wavelengths, 1064 and 532 nm, from Nd:YAG lasers, two arrays of 9 split beams with the same pitch were reconstructed. The illuminator performance was found rather sensitive to profile errors, which was supported by computer analysis.

Citation Download Citation

Jun Amako, Kimio Nagasaka, and Eiich Fujii "Direct laser writing of diffractive array illuminators operable at two wavelengths", Proc. SPIE 4416, Optical Engineering for Sensing and Nanotechnology (ICOSN 2001), (8 May 2001); https://doi.org/10.1117/12.427085

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