Integration of grating couplers and optical PBG elements in standard S.O.I guiding wafers using one lithography level process

Nicole A. Paraire; Pascal G. Filloux

doi:10.1117/12.451489

26 December 2001 Integration of grating couplers and optical PBG elements in standard S.O.I guiding wafers using one lithography level process

Nicole A. Paraire, Pascal G. Filloux

Author Affiliations +

Proceedings Volume 4438, Physics, Theory, and Applications of Periodic Structures in Optics; (2001) https://doi.org/10.1117/12.451489
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

Integration of photonic crystals on standard SOI wafers used in microelectronics seems very attractive due to the large demand for optical and opto-electronic components in telecommunications. The 200nm thick silicon superficial layer which can be an interesting monomode waveguide for the wavelengths of interest presents important draw-backs and characterization of elementary blocks is not easy as reliable coupling of light in such thin films is still a challenge. We propose here a demonstrator made of an elementary photonic crystal and its associated grating couplers introduced for characterization purposes carried out in single step lithography process. Dimensions have been defined in order to realize an omnidirectional mirror in the 1.3-1.5micrometers range.

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Nicole A. Paraire and Pascal G. Filloux "Integration of grating couplers and optical PBG elements in standard S.O.I guiding wafers using one lithography level process", Proc. SPIE 4438, Physics, Theory, and Applications of Periodic Structures in Optics, (26 December 2001); https://doi.org/10.1117/12.451489

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