Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm

Pierre Boher; Patrick Evrard; Jean-Philippe Piel; Jean-Louis P. Stehle

doi:10.1117/12.450107

10 December 2001 Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm

Pierre Boher, Patrick Evrard, Jean-Philippe Piel, Jean-Louis P. Stehle

Author Affiliations +

Proceedings Volume 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II; (2001) https://doi.org/10.1117/12.450107
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

Spectroscopic ellipsometry has long been recognized as the technique of choice to characterize thin films and multilayers. In 1983, SOPRA has developed the first commercial spectroscopic ellipsometer for research and development. Since this date, the wavelength range has been extended from visible to near infrared (2 micrometers ), and far infrared up to 18 micrometers . For 193-nm microlithography, deep UV option down to 190 nm has also been developed and delivered more recently. Instrumentation for the next generation of VUV lithography at 157 nm requires special optical setup since O₂ and H₂O are extremely absorbing below 190 nm. A new system has been developed which works into a purged glove box to reduce the oxygen and water contamination in the part per million range. The optical setup includes a premonochromator in the polariser arm to avoid photobleaching. The wavelength range of the instrument is 140-700 nm. The system works in rotating analyser configuration to minimize the parasitic residual polarisation. Ellipsometric and photometric measurements versus wavelength and angle of incidence can be performed. Scatterometric measurements can also be made. In this wavelength range, the samples are extremely sensitive to any surface contamination and surface roughness. It is why a grazing x-ray option has been added on the same instrument to provide a better picture of the analyzed samples. This paper presents in detail the new system with its two measurement methods, and including experimental results on resist, antireflective coatings and gate dielectrics for use in the field of microlithography.

Citation Download Citation

Pierre Boher, Patrick Evrard, Jean-Philippe Piel, and Jean-Louis P. Stehle "Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm", Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001); https://doi.org/10.1117/12.450107

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