Nascent Product Time-Of-Flight Distributions From Laser Initiated Etching Of Germanium By Bromine

Glenn P Davis; Cameron A Moore; Richard A. Gottscho

doi:10.1117/12.939445

14 June 1984 Nascent Product Time-Of-Flight Distributions From Laser Initiated Etching Of Germanium By Bromine

Glenn P Davis, Cameron A Moore, Richard A. Gottscho

Proceedings Volume 0459, Laser-Assisted Deposition, Etching, and Doping; (1984) https://doi.org/10.1117/12.939445
Event: 1984 Los Angeles Technical Symposium, 1984, Los Angeles, United States

Abstract

The dynamics of laser stimulated etching of Ge by Br₂ have been studied by characterization of the desorbed products. The product time-of-flight distribution was measured with a quadrupole mass spectrometer, providing both product identification and velocity analysis. Transient reflectivity measurements were used to determine when the melt threshold for Ge was exceeded. At low Br₂ pressure, etching at a rate of - 0.1 - 0.2Å per pulse was observed above the melt threshold. The principal product observed was GeBr₂, whose translational energy distribution deviated slightly from Maxwell-Boltzmann: the observed distribution was relatively rich in high energy species (i.e. hyperthermal).

Citation Download Citation

Glenn P Davis, Cameron A Moore, and Richard A. Gottscho "Nascent Product Time-Of-Flight Distributions From Laser Initiated Etching Of Germanium By Bromine", Proc. SPIE 0459, Laser-Assisted Deposition, Etching, and Doping, (14 June 1984); https://doi.org/10.1117/12.939445

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