Paper
30 October 2001 High-resolution micro-moire methods: principles and applications
Anand Krishna Asundi, Huimin Xie, Chai Gin Boay
Author Affiliations +
Proceedings Volume 4596, Advanced Photonic Sensors and Applications II; (2001) https://doi.org/10.1117/12.447352
Event: International Symposium on Photonics and Applications, 2001, Singapore, Singapore
Abstract
In this paper, the electron beam moire method and AFM scanning moire method are proposed to measure in-plane deformation in micro-scale. The measurement principle and techniques of these two methods are discussed in detail. Additionally, the phase shifting AFM moire method is advanced. The methods are used to measure the thermal deformation in the BGA and QFP electronic packages. The successful results verify the electron beam moire and AFM moire methods are effective tools for measuring micro-scale deformation.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anand Krishna Asundi, Huimin Xie, and Chai Gin Boay "High-resolution micro-moire methods: principles and applications", Proc. SPIE 4596, Advanced Photonic Sensors and Applications II, (30 October 2001); https://doi.org/10.1117/12.447352
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KEYWORDS
Atomic force microscopy

Electron beams

Phase shifting

Scanners

Picosecond phenomena

Deflectometry

Ferroelectric materials

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