Status of the liquid-xenon-jet laser-plasma source for EUV lithography

Bjoern A. M. Hansson; Lars Rymell; Magnus Berglund; Oscar E. Hemberg; Emmanuelle Janin; Jalmar Thoresen; Sofia Mosesson; Johan Wallin; Hans M. Hertz

doi:10.1117/12.472274

1 July 2002 Status of the liquid-xenon-jet laser-plasma source for EUV lithography

Bjoern A. M. Hansson, Lars Rymell, Magnus Berglund, Oscar E. Hemberg, Emmanuelle Janin, Jalmar Thoresen, Sofia Mosesson, Johan Wallin, Hans M. Hertz

Author Affiliations +

Proceedings Volume 4688, Emerging Lithographic Technologies VI; (2002) https://doi.org/10.1117/12.472274
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

The liquid-xenon-jet laser-plasma source is one of the extreme-ultraviolet (EUV) source technologies under development for EUV lithography. This paper presents some recent improvements of the technology, including the ability to operate a stable plasma at a distance of 50 mm from the nozzle, the first positive mirror-lifetime results, and improved laser-to-EUV conversion efficiency of 0.75 percent at lambda equals 13.45 nm.

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Bjoern A. M. Hansson, Lars Rymell, Magnus Berglund, Oscar E. Hemberg, Emmanuelle Janin, Jalmar Thoresen, Sofia Mosesson, Johan Wallin, and Hans M. Hertz "Status of the liquid-xenon-jet laser-plasma source for EUV lithography", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472274

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