CD variations from nontrivial mask-related factors

Z. Mark Ma; Won D. Kim; Benjamen M. Rathsack; Guoqiang Xing; Mark H. Somervell; Hyesook Hong

doi:10.1117/12.476928

1 August 2002 CD variations from nontrivial mask-related factors

Z. Mark Ma, Won D. Kim, Benjamen M. Rathsack, Guoqiang Xing, Mark H. Somervell, Hyesook Hong

Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476928
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan

Abstract

Mask critical dimension (CD) control relies on advanced write tools and resist processes. However, a specified write tool and process does not necessarily guarantee high mask quality. As the mask feature size shrinks to below 500 nm, there are other mask-related factors that can also significantly affect the mask performance. This paper discusses the impact of those non-trivial factors, such as mask writing tool and process control, calibration of mask CD metrology, blank quality of attenuated phase shift mask (ATPSM), pellicle degradation due to 193 nm laser irradiation, and profile of mask features, etc.

Citation Download Citation

Z. Mark Ma, Won D. Kim, Benjamen M. Rathsack, Guoqiang Xing, Mark H. Somervell, and Hyesook Hong "CD variations from nontrivial mask-related factors", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.476928

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