Integrating real-time CD corrections into a laser pattern generator

Steven Haddleton; Lars Ivansen; Michal Simecek; Uwe Schnitker; Lars Stiblert; Manfred Enzinger; Wolfgang Roessl; Mats Sundqvist; Christian K. Kalus

doi:10.1117/12.476922

1 August 2002 Integrating real-time CD corrections into a laser pattern generator

Steven Haddleton, Lars Ivansen, Michal Simecek, Uwe Schnitker, Lars Stiblert, Manfred Enzinger, Wolfgang Roessl, Mats Sundqvist, Christian K. Kalus

Author Affiliations +

Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476922
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan

Abstract

Controlling the critical dimension is central in mask manufacturing, and with the ever-shrinking design rule - and hence the increasing requirements on the mask fidelity - new and visionary ways of pushing the envelope of the critical dimension (CD), becomes essential. Research tools and off-line solutions for sizing, proximity correction and other CD compensations have been pursued for some time, but making efficient use of such technologies have been limited by ease-of-use, fracturing and computational time and data volumes associated. Here, we present techniques to deal with these challenges by taking the approach to integrate the solutions into a modern, real-time pattern generator datapath. The solution is based on hierarchical treatment of the patterns in the real-time data path of the pattern generator. By placing it in the real-time domain, we avoid the problem with exploding stream data volumes, and can exploit the parallel architecture and raw computational power of the data path engine.

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Steven Haddleton, Lars Ivansen, Michal Simecek, Uwe Schnitker, Lars Stiblert, Manfred Enzinger, Wolfgang Roessl, Mats Sundqvist, and Christian K. Kalus "Integrating real-time CD corrections into a laser pattern generator", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.476922

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