Paper
5 December 2002 Intermixing effect on asymmetric quantum well
Guibin Chen, Zhifeng Li, Zhongli Miao, Xiaoshuang Chen, Wei Lu
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Abstract
Ion implantation enhanced intermixing of quantum well has become an important technology in device fabrication and material modification. We report the intermixing effect in a single asymmetric coupled quantum well (GaAs/AlGaAs) at different ion implantation dose by photoluminescence. More than 80meV of blue shift of the interband transition was observed before rapid thermal annealing process. It indicates that the intermixing has almost finished during the implantation process. A diffusion length of 1nm is obtained by the theoretical analysis.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guibin Chen, Zhifeng Li, Zhongli Miao, Xiaoshuang Chen, and Wei Lu "Intermixing effect on asymmetric quantum well", Proc. SPIE 4795, Materials for Infrared Detectors II, (5 December 2002); https://doi.org/10.1117/12.453828
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KEYWORDS
Quantum wells

Aluminum

Luminescence

Ion implantation

Annealing

Gallium arsenide

Interfaces

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