Intensity ratio alignment technique in photoelastic modulation ellipsometry and polarimetry

Yu-Faye Chao

doi:10.1117/12.474392

17 February 2003 The intensity ratio alignment technique in photoelastic modulation ellipsometry and polarimetry

Yu-Faye Chao

Proceedings Volume 4833, Applications of Photonic Technology 5; (2003) https://doi.org/10.1117/12.474392
Event: Applications of Photonic Technology 5, 2002, Quebec City, Canada

Abstract

The concept of intensity ratio alignment technique will be introduced by comparing it with the conventional null technique. For in situ/real time monitoring the plasma etching process, we will introduce a fixed incident angle alignment technique for a photoelastic modulation ellipsometer. In addition to ellipsometry, we will introduce a photoelastic modulation polarimetry to measure the twisted angle and phase retardation of a twisted nematic liquid.

Citation Download Citation

Yu-Faye Chao "The intensity ratio alignment technique in photoelastic modulation ellipsometry and polarimetry", Proc. SPIE 4833, Applications of Photonic Technology 5, (17 February 2003); https://doi.org/10.1117/12.474392

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