Mask blank particle inspection in vacuum environments

Akihiko Sekine; Hiroyuki Nagahama; Toru Tojo; Kiminobu Akeno; Ryoichi Hirano

doi:10.1117/12.467384

18 October 2002 Mask blank particle inspection in vacuum environments

Akihiko Sekine, Hiroyuki Nagahama, Toru Tojo, Kiminobu Akeno, Ryoichi Hirano

Proceedings Volume 4902, Optomechatronic Systems III; (2002) https://doi.org/10.1117/12.467384
Event: Optomechatronic Systems III, 2002, Stuttgart, Germany

Abstract

The mask blank surface inspection system for the electron beam mask writing system (EB mask writer) has developed. This system, that has the small vacuum chamber attachable to EB mask writer, inspects a mask blank that is just before EB writing in vacuum environments. It can inspect whole area of the 230mm mask at 0.3micrometer sensitivity. It also can perform fast inspection by applying the original scanning algorithm for the laser beam. It has the wide detective range from 0.3 to 2.0 micrometers of particle size. It can distinguish sizes of particles in that range. The auto focus function is most important factor for maintaining the sensitivity.

Citation Download Citation

Akihiko Sekine, Hiroyuki Nagahama, Toru Tojo, Kiminobu Akeno, and Ryoichi Hirano "Mask blank particle inspection in vacuum environments", Proc. SPIE 4902, Optomechatronic Systems III, (18 October 2002); https://doi.org/10.1117/12.467384

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