54-deg. high-reflection phase retarder at 1315 nm

Ying-Jian Wang; Zhaosheng Tang; Zhengxiu Fan

doi:10.1117/12.481771

5 September 2002 54-deg. high-reflection phase retarder at 1315 nm

Ying-Jian Wang, Zhaosheng Tang, Zhengxiu Fan

Proceedings Volume 4914, High-Power Lasers and Applications II; (2002) https://doi.org/10.1117/12.481771
Event: Photonics Asia, 2002, Shanghai, China

Abstract

In this paper, the periodic all dielectric multilayers of high reflection phase retarders are designed. And the software of Tfcalc has been used to optimized for the design that produces a 900phase shift between the p- and s- polarization components at the incidence angle of 540 and at the wavelength of 1315 nm while maintaining high reflectivity (>99.90%) for both components. A tolerance analysis indicates that the coating layers must be deposited within ±14% to achieve a 90± iO° phase shift error.

Citation Download Citation

Ying-Jian Wang, Zhaosheng Tang, and Zhengxiu Fan "54-deg. high-reflection phase retarder at 1315 nm", Proc. SPIE 4914, High-Power Lasers and Applications II, (5 September 2002); https://doi.org/10.1117/12.481771

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