Homogeneous poling of the large-diameter PPLN wafer by means of high-voltage electric pulse triggering

Yonghang Shen; Haihua Hu; Linhua Ye; Haibin Xu; Bo Wu

doi:10.1117/12.483052

17 September 2002 Homogeneous poling of the large-diameter PPLN wafer by means of high-voltage electric pulse triggering

Yonghang Shen, Haihua Hu, Linhua Ye, Haibin Xu, Bo Wu

Author Affiliations +

Proceedings Volume 4918, Materials, Devices, and Systems for Display and Lighting; (2002) https://doi.org/10.1117/12.483052
Event: Photonics Asia, 2002, Shanghai, China

Abstract

A two-step poling technique was presented for the homogenously poling of the large diameter LN wafers. Aluminum was used as the electrode material and confirmed to be suitable for the PPLN poling purpose. PPLN wafers with a homogenously poling area greater than 52 mm in diameter have been fabricated. Experimental parameters for the homogenously poling of the 3-inch LN wafer were also presented.

Citation Download Citation

Yonghang Shen, Haihua Hu, Linhua Ye, Haibin Xu, and Bo Wu "Homogeneous poling of the large-diameter PPLN wafer by means of high-voltage electric pulse triggering", Proc. SPIE 4918, Materials, Devices, and Systems for Display and Lighting, (17 September 2002); https://doi.org/10.1117/12.483052

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