Estimated impact of shot noise in extreme-ultraviolet lithography

Jonathan L. Cobb; Frances A. Houle; Gregg M. Gallatin

doi:10.1117/12.484730

16 June 2003 Estimated impact of shot noise in extreme-ultraviolet lithography

Jonathan L. Cobb, Frances A. Houle, Gregg M. Gallatin

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.484730
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Through simulation we examine the predicted resist images for 50- and 80-nm contacts in the presence of three sources of fluctuations: those associated with random photon absorption sites, those associated with dose statistics, and those associated with resist chemistry. Photon absorption simulations were done using simple optics theory or Monte Carlo techniques. These absorption maps were converted into an initial map of photoacid concentration and a realistic PEB model was used to obtain the developable latent image. A new dissolution model was used to estimate the final resist profile, and image analysis routines were used to extract the centroid position jitter, diameter fluctuations, and edge roughness statistics. The simulations show that each source of fluctuation can be significant, and we propose an experiment that will detect the presence of shot noise and partially separate the three fluctuation sources.

Citation Download Citation

Jonathan L. Cobb, Frances A. Houle, and Gregg M. Gallatin "Estimated impact of shot noise in extreme-ultraviolet lithography", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484730

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