Glass transition temperature studies in thin photoresist films with an interferometric method

Dimitra Niakoula; Ioannis Raptis; Vasilios Bellas; Panagiotis Argitis

doi:10.1117/12.485072

12 June 2003 Glass transition temperature studies in thin photoresist films with an interferometric method

Dimitra Niakoula, Ioannis Raptis, Vasilios Bellas, Panagiotis Argitis

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485072
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Effects of process variables, such as film thickness, type of substrate and thermal processing conditions on T_g^film were explored using Optical Interferometry; a novel, low-cost, rapid methodology. This methodology is applied for in-situ measurement of the glass transition temperature in thin resist films (T_g^film) spin-coated on flat reflective substrates. The presented methodology enabled studies on T_g changes during resist processing in characteristic positive and negative tone chemically amplified (CA) resist materials allowing deeper insight in resist optimization issues. The film thickness and substrate effects on T_g^film were studied in the case of one positive chemically amplified resist (commercial for DUV) as well as the exposure effect on T_g^film in the case of a negative chemically amplified resist formulations. Also a series of POSS-based new copolymers under evaluation for use in 157nm lithography are studied in order to reveal the film quality. In the last case new copolymers with components interacting strongly with the substrate surface were examined and the calculated T_g^film from the OPTI method differs from the corresponding DSC bulk values.

Citation Download Citation

Dimitra Niakoula, Ioannis Raptis, Vasilios Bellas, and Panagiotis Argitis "Glass transition temperature studies in thin photoresist films with an interferometric method", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485072

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available