Intel's EUV resist development

Heidi B. Cao; Jeanette M. Roberts; Janel Dalin; Manish Chandhok; Robert P. Meagley; Eric M. Panning; Melissa K. Shell; Bryan J. Rice

doi:10.1117/12.485095

12 June 2003 Intel's EUV resist development

Heidi B. Cao, Jeanette M. Roberts, Janel Dalin, Manish Chandhok, Robert P. Meagley, Eric M. Panning, Melissa K. Shell, Bryan J. Rice

Author Affiliations +

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485095
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

The success of extreme ultraviolet (EUV) lithography depends upon developing resists that meet the patterning requirements for the technology node in which EUV is inserted. This paper presents Intel’s patterning requirements and development strategies for EUV resists. Two of the primary problems for EUV resists are meeting the linewidth roughness (LWR) requirement, and reducing resist absorbance to obtain good sidewall profiles. Benchmarking data shows that none of the current EUV photoresists meet LWR targets. Modeling results for EUV resists show the impact of resist absorbance on sidewall angle and resolution.

Citation Download Citation

Heidi B. Cao, Jeanette M. Roberts, Janel Dalin, Manish Chandhok, Robert P. Meagley, Eric M. Panning, Melissa K. Shell, and Bryan J. Rice "Intel's EUV resist development", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485095

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available