Paper
26 June 2003 Image fidelity improvement through optical proximity correction and its limits
Author Affiliations +
Abstract
Lack of image fidelity, such as corner rounding and line end foreshortening, can have adverse effects on semiconductor devices and circuits, and its magnitude is of interest to lithography integration into the device flow. Yet corner rounding is rarely quantified. The question arises which fraction of the problem can be corrected by optical proximity correction, and which fraction cannot be corrected because of the spatial frequency limitation of the image transfer process. Image fidelity problems typically get worse with highly coherent illumination settings that are used for alternating phase shifting masks, so it is important to investigate corner rounding in connection with such masks. Equally, it is important to understand the impact of numerical aperture on corner rounding. Because of its simple shape, a corner lends itself to simulated and experimental evaluation. We propose a metrology algorithm for corner rounding and investigate it with simulation and experiment. We study the impact of optical settings, mask parameters, and serifs on corner rounding and discuss the impact on optical proximity correction.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Martin Burkhardt and Nakgeuon Seong "Image fidelity improvement through optical proximity correction and its limits", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485466
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Hough transforms

Metrology

Detection and tracking algorithms

Optical proximity correction

Photomasks

Image processing

Edge detection

Back to Top